VII Curso Introducción a la Investigación13 15 Ab il 201113-15 Abril 2011
Nanolitografía con PolímerosNanolitografía con Polímeros
T A EzquerraT.A. Ezquerra
SOFMATPOLDept. Física Macromolecularp
Instituto de Estructura de la Materia, CSIC, Serrano 119, 121, 28006 Madrid, Spain
Nanotechnology : The origin
“There's Plenty of Room at the Bottom”Richard P. Feynman (Physics Nobel Prize 1965)y ( y )
Conference on December 29th 1959 at the annual meeting of theAmerican Physical Society
http://www.zyvex.com/nanotech/feynman.html
• “……I want to talk about is the problem of manipulating and controlling things on a small scale”
• “…..Why cannot we write the entire 24 volumes of the Encyclopedia Brittanicaon the head of a pin?”
• “…Why can't we drill holes, cut things, solder things, stamp things out, mold different shapes all at an infinitesimal level?”
Be realistic and demand the impossible ¡ Paris Graffiti, May 1968
Outline
“There's Plenty of Room at the Bottom”Richard P. Feynman (Physics Nobel Prize 1965)y ( y )
• “…..Why cannot we write the entire 24 volumes of the Encyclopedia Brittanicaon the head of a pin?”
How to write?
• electrons
• lightHow to read?
light
• small tools
Reading and Writing with Light : DVD technology
• Write with a Laser beam (Burning)
• Read with a Laser beam• Read with a Laser beam
microns
Writing with electrons: e-beam lithography
Electron beamClean Room
P l filPolymer film
Silicon
Writing with electrons: Reactive Ion Etching (RIE)
Gold evaporation
Lift off Reactive Ion Etching (RIE)
p
PolymerPolymer
Silicon
Polymer solution
RIE
Nano-Molding
Nanometers
L.J. Guo, Adv. Mater. 2007, 19, 495–513
Nano-Imprint Lithography (NIL)
Polymer
Silicon
NIL Applications : Nanosensors ( SERS Biochips )NIL Applications : Nanosensors ( SERS, Biochips…..)NanodevicesNanotemplates (Soft-Nanolitography, nanomolds…..)
Working conditions: LARGE SCALE FACILITIES
Clean Room
Instituto de Microelectrónica de Barcelona
Instituto de Sistemas Optoelectrónicos y Microtecnología (ISOM)Universidad Politécnica de Madrid
Nano-Molding @ SOFMATPOL_Group_IEM-CSIC
N t M tifNanometer Motifs
Nano-IMPRINT (NIL) @ SOFMATPOL_Group_IEM-CSIC
Poly(trimethylene terephthalate)
Atomic Force Microscopy (AFM)@ SOFMAT_Group_IEM-CSIC
Nanoscope IIIA Multimode ( Vecco ) operating in the tapping mode.
qz
Grazing Incidence X-ray Scattering (GISAXS)
SCATTERING “IN PLANE”SCATTERING “IN PLANE”
• qy= 0St t l l ti di l t th fil f
SCATTERING “IN PLANE”SCATTERING “IN PLANE”
• qy= 0St t l l ti di l t th fil f
• qy= 0St t l l ti di l t th fil f
qy
SCATTERING “OUT OF PLANE”SCATTERING “OUT OF PLANE”
)sin(sin2fizq
qz: wavevector component perpendicular to the film surface.
• Structural correlation perpendicular to the film surface:
SCATTERING “OUT OF PLANE”SCATTERING “OUT OF PLANE”
)sin(sin2fizq
qz: wavevector component perpendicular to the film surface.
• Structural correlation perpendicular to the film surface:• Structural correlation perpendicular to the film surface:
X ray beam)cos(sin2
fyq
SCATTERING OUT OF PLANESCATTERING OUT OF PLANE
qy: wavevector component parallel to the film surface.
• qz= constant• Structural correlation parallel to the film surface:
)cos(sin2fyq
SCATTERING OUT OF PLANESCATTERING OUT OF PLANE
qy: wavevector component parallel to the film surface.
• qz= constant• Structural correlation parallel to the film surface:• qz= constant• Structural correlation parallel to the film surface:
X-ray beamX-ray beam
BW4 Beamline.
f HASYLAB, DESY (Hamburg, Germany)
i
i
Si_Mold
Results : Grazing Incidence X-ray ScatteringISOM_3
e-beam Lithography in Si
Plantilla A(nm) B(nm) C = A+B 1 93 55 1482 136 59 1953 91 21 1124 149 44 1936 94 19 1136 94 19 113
8b 58 40 98
25 nm
2.5x2.5 ?m2ISOM_3a_180_an265_1
10
EXP = 0.4
: disorder factor 10-7→1-dimensional crystallinelattice
25 nm
35 n
m
I(a.u
.)
0.1
1=0.0=0.4
EXP
omega
-0.4 -0.2 0.0 0.2 0.40.01
4x4 ?m2
MODMOD
4x4 ?m2
X-ray Scattering @ SOFMAT_Group_IEM-CSIC
rayos Xrayos Xrayos XCátodo
à d
rayos Xrayos Xrayos X
ànodoe-e-e-
Producción de Rayos X : SincrotronesX-ray Scattering @ Large Facilities . Synchrotrons
Estaciones de trabajo (beam-lines)
Linac . Acelerador lineal
Linac
Anillo de inyección
Linac
G d
Anillo
Generador de e- 270 m
Anillo
European Synchrotron Radiation Facility (ESRF), Grenoble, France
LARGE SCALE FACILITIES : Synchrotrons
ALBA
http://www.cells.es
Aurora Nogales
A Flash of SOFMATPOL in one Minute
Daniel MartínezgX-ray, Neutrons, PhysicsDielectrics, Biophysics
Ignacio Martín-Fabiani
Dielectrics, PhysicsBlends, Copolymers
Come and make a PhD with us ¡gX-ray, AFM, Physics Dielectrics, Nanofilms
Amelia Linares
Come and make a PhD with us ¡
http://www.iem.cfmac.csic.es/softmatpol/Amelia LinaresConductivity, ChemistryNanocomposites
Alejandro SanzMariCruz GarcíaX-ray, Microfocus Physics,
p p
Alejandro SanzNeutrons, Dielectrics, CalorimetryCrystallization, Dynamics, Liquids
Daniel Rueda
y, f y ,MicroMechanics, Nanomaterials
José Carlos CanaldaX-rays Calorimetry ChemistryDaniel Rueda
X-ray crystallography ,Chemistry Crystallization, Nanomaterials
X-rays, Calorimetry, ChemistryHandyman, SciFiction, Webmaster
Maria Esperanza CagiaoX-rays Calorimetry ChemistryX-rays, Calorimetry, Chemistry Microhardness
Tiberio EzquerraToday’s Speaker
Mi h l S iJaime HernándezAFM X Ch i tMichela Soccio
Chemistry,DielectricsX-rays, Calorimetry
AFM, X-rays, ChemistryNanomaterials
Thanks to MICINN : AT2009-07789 ;MAT2008-03232