microelectronics - mosfet lecture - iit kanpur

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  • 8/12/2019 Microelectronics - MOSFET Lecture - IIT Kanpur

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    EE210: Microelectronics-I

    Lecture-27 : MOSFET-1

    B. Mazhari

    G-NumberB. Mazhari, IITK

    1Dept. of EE, IIT Kanpur

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    Transistor

    +

    IO

    +

    VoVIN

    -

    urren O s muc more sens ve o IN an O

    O O

    in oV V

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    Field Effect Principle O Oin o

    I I

    V V

    -2V

    - - - - - - - - - -- - - - - - -

    + - + -+ - + - + - + - + - + -

    N-Type+ -

    + -+ - + - + - + - + - + -+ - + - + - + - + - + -

    Modulation of conductivity using electric field

    Transconductance

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  • 8/12/2019 Microelectronics - MOSFET Lecture - IIT Kanpur

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    N-Type

    Oxide

    N-Type

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    Transistors

    Transistor

    BipolarJunction FieldEffectTransistorTransistor(BJT) (FET)

    MetalOxidesemiconductor(MOSFET)

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    Depletion-Mode Transistor

    DrainSource

    0V 5V

    -

    n+n+ N-type

    -

    0V

    In a depletion-mode transistor, a channel exists without any gate voltage beingapplied and current flows when drain voltage is applied.

    current to reduce.

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    Channel exists at zero gate voltage and is depleted by gate voltage

    DrainSource-1V

    -2V-3V

    Oxide

    n+n+

    p-type

    Channel is completely pinched off and current ~zero

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    NMOS Enhancement mode transistor: Inversion ModeTransistor

    G

    SiO

    -S

    N+N

    +

    P-Silicon

    B

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    Gate

    ource0V 5V

    n+n+

    p-type

    Body0V

    No channel exists when gate voltage is zero and current is

    zero as we .

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    Sourcee Drain

    +

    .+ + + + + + + + + + +

    Oxide

    +

    +

    +

    +

    n+ n+ + + + +

    -

    + + + +

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    Sourcee Drain

    +

    .+ + + + + + + + + + +

    Oxide

    - -n+ n+ + + + +

    -

    + + + +

    Depletion width increases in p n

    But something interesting happens: electron density at the surface also

    increases

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    At a sufficiently large voltage (>VTHN) a channel of electrons

    forms at the Si/SiO2 interface.

    GateDrainSource + + + + + + + + + + + + + +

    Oxide

    - - - - - - - - - - - - - - - - - - -

    p-type

    Body

    Depletion charge

    (inversion layer)

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    Conductivity modulation at the surface?

    V

    Gate

    + + + + + + +

    +

    +

    +

    +

    +

    +

    +

    + + + + + + +

    p-type + + + + + +

    16 3

    2

    10A

    p N cm

    n

    A

    n cm

    N

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    Field Effect 2 20 31 10s sn p n cm

    VG T

    1016

    1015

    1010

    108

    104

    Ps:

    104

    105

    1010

    1012

    n : 1016

    1017

    InvertedStrong

    Inversion.

    Surface P-Type

    Intrinsic

    N-Type

    Surface carrier density can be changed from P-type to N-type

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    Surface Carrier Density

    ps ns

    NAps

    ni

    ns

    VV

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    Flat band condition

    V V

    VG

    Oxide

    Whenever two different

    material are brought into

    + + + + + + +

    + + + + + + +

    ,

    potential difference

    develops like in a pn

    -

    +

    +

    +

    +

    +

    +

    +unc on. us even

    when no gate voltage is

    applied, there is a

    Body

    voltage across the mos

    capacitor.

    V = V Flat-band condition meanin no NET volta e across the ca acitor.

    Uniform hole density everywhere

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    Depletion

    butG FB G THN V V V V

    Gate

    Oxide

    + + + + + + + Depletion region

    p-type +

    +

    +

    +

    +

    +

    +

    + + + + + +

    Body

    Holes are depleted from the surface S Bp p

    Although n electron density is also very smallS Bn

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    Strong Inversion G THN V V

    Gate

    Oxide

    - - - - - - - - - - - - - - - - - - - - - - - - -

    Depletion region

    p-type

    +

    +

    +

    +

    +

    +

    + + + + + + +

    Body

    Electrons are accumulated at the surface S An N

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    Accumulation

    G FBV V

    Gate

    Oxide

    + + + ++

    + + + + + + + extra holes

    p-type

    +

    +

    +

    +

    +

    +

    + + + + + + +

    Body

    Holes are accumulated at the surface S Bp p

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    MetalOxideSemiconductorFieldEffectTransistor:

    MOSFET

    Depletion Mode Enhancement Mode

    N-Channel P-Channel N-Channel P-Channel

    G GG B

    S S

    SS

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    Simplified Symbols and structure

    G

    D

    G

    D

    B

    S

    S/BNMOS

    Gatera nSource

    OxideDrain

    Oxide

    Gate

    SourceBody

    n+n+n+n+p+

    p-type

    Body

    p-type

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    Simplified Symbols and structure

    DrainGate

    D D Oxide

    + +G

    S/B

    B

    PMOS -

    Body

    DrainGateSourceBod

    Oxide

    ++n+

    n-t e

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    G G

    Oxide

    +

    B SB

    ++ + ++

    DD

    n-type

    p-type

    Body potential of NMOS transistors is same and is normally connected to

    body-source PN junction is reverse biased.

    ac can e a r cate n a separate n v ua -we an t us

    each pmos body terminal can have a distinct voltage. Normally body and

    source terminals of PMOS are shorted together.

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    B S

    G

    BS

    D

    G

    D

    n+ n+p+ p+ n+ n+

    Two NMOS side-by-side-

    B S

    G

    BS

    D

    G

    D

    p+p+p+ p+n+ n+

    x ex e

    n-type

    p-type - - -