microelectronics - mosfet lecture - iit kanpur
TRANSCRIPT
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EE210: Microelectronics-I
Lecture-27 : MOSFET-1
B. Mazhari
G-NumberB. Mazhari, IITK
1Dept. of EE, IIT Kanpur
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Transistor
+
IO
+
VoVIN
-
urren O s muc more sens ve o IN an O
O O
in oV V
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Field Effect Principle O Oin o
I I
V V
-2V
- - - - - - - - - -- - - - - - -
+ - + -+ - + - + - + - + - + -
N-Type+ -
+ -+ - + - + - + - + - + -+ - + - + - + - + - + -
Modulation of conductivity using electric field
Transconductance
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N-Type
Oxide
N-Type
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Transistors
Transistor
BipolarJunction FieldEffectTransistorTransistor(BJT) (FET)
MetalOxidesemiconductor(MOSFET)
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Depletion-Mode Transistor
DrainSource
0V 5V
-
n+n+ N-type
-
0V
In a depletion-mode transistor, a channel exists without any gate voltage beingapplied and current flows when drain voltage is applied.
current to reduce.
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Channel exists at zero gate voltage and is depleted by gate voltage
DrainSource-1V
-2V-3V
Oxide
n+n+
p-type
Channel is completely pinched off and current ~zero
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NMOS Enhancement mode transistor: Inversion ModeTransistor
G
SiO
-S
N+N
+
P-Silicon
B
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Gate
ource0V 5V
n+n+
p-type
Body0V
No channel exists when gate voltage is zero and current is
zero as we .
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Sourcee Drain
+
.+ + + + + + + + + + +
Oxide
+
+
+
+
n+ n+ + + + +
-
+ + + +
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Sourcee Drain
+
.+ + + + + + + + + + +
Oxide
- -n+ n+ + + + +
-
+ + + +
Depletion width increases in p n
But something interesting happens: electron density at the surface also
increases
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At a sufficiently large voltage (>VTHN) a channel of electrons
forms at the Si/SiO2 interface.
GateDrainSource + + + + + + + + + + + + + +
Oxide
- - - - - - - - - - - - - - - - - - -
p-type
Body
Depletion charge
(inversion layer)
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Conductivity modulation at the surface?
V
Gate
+ + + + + + +
+
+
+
+
+
+
+
+ + + + + + +
p-type + + + + + +
16 3
2
10A
p N cm
n
A
n cm
N
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Field Effect 2 20 31 10s sn p n cm
VG T
1016
1015
1010
108
104
Ps:
104
105
1010
1012
n : 1016
1017
InvertedStrong
Inversion.
Surface P-Type
Intrinsic
N-Type
Surface carrier density can be changed from P-type to N-type
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Surface Carrier Density
ps ns
NAps
ni
ns
VV
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Flat band condition
V V
VG
Oxide
Whenever two different
material are brought into
+ + + + + + +
+ + + + + + +
,
potential difference
develops like in a pn
-
+
+
+
+
+
+
+unc on. us even
when no gate voltage is
applied, there is a
Body
voltage across the mos
capacitor.
V = V Flat-band condition meanin no NET volta e across the ca acitor.
Uniform hole density everywhere
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Depletion
butG FB G THN V V V V
Gate
Oxide
+ + + + + + + Depletion region
p-type +
+
+
+
+
+
+
+ + + + + +
Body
Holes are depleted from the surface S Bp p
Although n electron density is also very smallS Bn
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Strong Inversion G THN V V
Gate
Oxide
- - - - - - - - - - - - - - - - - - - - - - - - -
Depletion region
p-type
+
+
+
+
+
+
+ + + + + + +
Body
Electrons are accumulated at the surface S An N
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Accumulation
G FBV V
Gate
Oxide
+ + + ++
+ + + + + + + extra holes
p-type
+
+
+
+
+
+
+ + + + + + +
Body
Holes are accumulated at the surface S Bp p
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MetalOxideSemiconductorFieldEffectTransistor:
MOSFET
Depletion Mode Enhancement Mode
N-Channel P-Channel N-Channel P-Channel
G GG B
S S
SS
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Simplified Symbols and structure
G
D
G
D
B
S
S/BNMOS
Gatera nSource
OxideDrain
Oxide
Gate
SourceBody
n+n+n+n+p+
p-type
Body
p-type
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Simplified Symbols and structure
DrainGate
D D Oxide
+ +G
S/B
B
PMOS -
Body
DrainGateSourceBod
Oxide
++n+
n-t e
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G G
Oxide
+
B SB
++ + ++
DD
n-type
p-type
Body potential of NMOS transistors is same and is normally connected to
body-source PN junction is reverse biased.
ac can e a r cate n a separate n v ua -we an t us
each pmos body terminal can have a distinct voltage. Normally body and
source terminals of PMOS are shorted together.
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B S
G
BS
D
G
D
n+ n+p+ p+ n+ n+
Two NMOS side-by-side-
B S
G
BS
D
G
D
p+p+p+ p+n+ n+
x ex e
n-type
p-type - - -